Applications from the field of Semiconductor Analysis - page 10

Measuring the optical properties of photovoltaic cells using the Agilent Cary 5000 UV-Vis-NIR spectrophotometer and the External DRA-2500

Applications

| 2011 | Agilent Technologies

NIR Spectroscopy, UV–VIS spectrophotometry

Instrumentation

NIR Spectroscopy, UV–VIS spectrophotometry

Manufacturer

Agilent Technologies

Industries

Materials Testing, Semiconductor Analysis

WCPS: Ultratrace Analysis of Phosphorus, Boron and Other Impurities in Photovoltaic Silicon and Trichlorosilane by ICP-MS with High Energy Collision Cell

Posters

| 2011 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Basic Performance of the Agilent 7700s ICP-MS for the Analysis of Semiconductor Samples

Technical notes

| 2010 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Characterization of Amorphous and Microcrystalline Silicon using Raman Spectroscopy

Applications

| 2009 | Thermo Fisher Scientific

RAMAN Spectroscopy, Microscopy

Instrumentation

RAMAN Spectroscopy, Microscopy

Manufacturer

Thermo Fisher Scientific

Industries

Materials Testing, Semiconductor Analysis

Ultratrace Analysis of Solar (Photovoltaic) Grade Bulk Silicon by ICP-MS

Applications

| 2008 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Analysis of Electroceramics by Laser Ablation ICP-MS

Applications

| 2004 | Agilent Technologies

ICP/MS, Laser ablation

Instrumentation

ICP/MS, Laser ablation

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Direct Analysis of Photoresist and Related Solvents Using the Agilent 7500cs ICP-MS

Applications

| 2004 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Determination of Trace Metal Impurities in Semiconductor Grade Phosphoric Acid by High Sensitivity Reaction Cell ICP-MS

Applications

| 2003 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Characterization of Trace Impurities in Silicon Wafers by High Sensitivity Reaction Cell ICP-MS

Applications

| 2003 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Characterization of Surface Metal Contamination on Silicon Wafers Using Surface Metal Extraction Inductively Coupled Plasma Mass Spectrometry (SME- ICP-MS)

Applications

| 2001 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis