Ultra trace measurement of potassium and other elements in ultrapure water using the Agilent 8800 ICP-QQQ in cool plasma reaction cell mode

Applications | 2014 | Agilent TechnologiesInstrumentation
Semiconductor Analysis
Agilent Technologies
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5th EditionHandbook of ICP-QQQApplications using theAgilent 8800 and 8900Primer > Return to table of contents> Search entire documentForewordAgilent Technologies launched its 8800 Triple QuadrupoleICP-MS (ICP-QQQ) at the 2012 Winter Conference on PlasmaSpectrochemistry in Tucson, Arizona, USA.By the time the first ICP-QQQ...
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Applications of ICP-MSMeasuring Inorganic Impuritiesin Semiconductor ManufacturingApplication Compendium > Return to table of contents> Search entire documentTable of contentsICP-MS and ICP-QQQ in the Semiconductor Industry4Agilent Has Three Decades of ICP-MS Experience DrivingContinuous Innovation7Agilent ICP-MS Solutions for the Semiconductor Industry8Automating Analysis of...
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Application NoteSemiconductorUltrapure Process Chemicals Analysisby ICP-QQQ with Hot PlasmaConditionsMeeting single- and sub-ppt guideline levels forASTM/SEMI elements in ultrapure water using anAgilent 8900 ICP-QQQAuthorsKazuhiro Sakai and YoshinoriShimamuraAgilent Technologies, Inc.IntroductionContamination control is critical in semiconductor device fabrication (FAB) facilities(1). Contaminants may be...
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