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    ICP-OES Background and Interference Removal

    Technical notes
    | 2020 | Agilent Technologies
    ICP/OES
    Instrumentation
    ICP/OES
    Manufacturer
    Agilent Technologies
    Industries

    Improve Data Integrity and Remove Analytical Variables in UV-Vis Measurements

    Applications
    | 2019 | Agilent Technologies
    UV–VIS spectrophotometry
    Instrumentation
    UV–VIS spectrophotometry
    Manufacturer
    Agilent Technologies
    Industries
    Pharma & Biopharma

    ORS4 AND HELIUM MODE FOR MORE EFFECTIVE INTERFERENCE REMOVAL IN COMPLEX SAMPLES

    Others
    | 2015 | Agilent Technologies
    ICP/MS
    Instrumentation
    ICP/MS
    Manufacturer
    Agilent Technologies
    Industries

    ENHANCED HELIUM MODE CELL PERFORMANCE FOR IMPROVED INTERFERENCE REMOVAL IN ICP-MS

    Others
    | 2015 | Agilent Technologies
    ICP/MS
    Instrumentation
    ICP/MS
    Manufacturer
    Agilent Technologies
    Industries

    Accurate Analysis of Trace Mercury in Cosmetics using the Agilent 8900 ICP-QQQ

    Applications
    | 2019 | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries
    Others

    Direct Analysis of Zirconium-93 in Nuclear Site Decommissioning Samples by ICP-QQQ

    Applications
    | 2020 | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries
    Environmental

    Analysis of Platinum Group Elements (PGEs) in road dust using the Agilent 8900 Triple Quadrupole ICP-MS in MS/MS mode

    Posters
    | N/A | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries
    Environmental

    Direct Measurement of Metallic Impurities in 20% Ammonium Hydroxide by 7700s/7900 ICP-MS

    Applications
    | 2017 | Agilent Technologies
    ICP/MS
    Instrumentation
    ICP/MS
    Manufacturer
    Agilent Technologies
    Industries
    Semiconductor Analysis

    Unmatched Removal of Spectral Interferences in ICP-MS Using the Agilent Octopole Reaction System with Helium Collision Mode

    Technical notes
    | 2006 | Agilent Technologies
    ICP/MS
    Instrumentation
    ICP/MS
    Manufacturer
    Agilent Technologies
    Industries

    Removal of hydride ion interferences (MH+ ) on Rare Earth Elements using the Agilent 8800 Triple Quadrupole ICP-MS

    Applications
    | 2012 | Agilent Technologies
    ICP/MS, ICP/MS/MS
    Instrumentation
    ICP/MS, ICP/MS/MS
    Manufacturer
    Agilent Technologies
    Industries
    Environmental
     

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