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Ultrapure Process Chemicals Analysis by ICP-QQQ with Hot Plasma Conditions
Applications
| 2021 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Analysis of Ultratrace Impurities in High Silicon Matrix Samples by ICP-QQQ
Applications
| 2021 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Quantifying Metal Impurities in Li-Ion Battery Raw Materials by ICP-MS/MS
Applications
| 2022 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Energy & Chemicals
Elemental and Particle Analysis of N-Methyl-2-Pyrrolidone (NMP) by ICP-MS/MS
Applications
| 2022 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
WCPS: Direct Metal Analysis by New Galvano-Mirror fs-LA-ICP-MS using 100%-Normalization Method with NIST 612 Glass CRM as Calibration Standard
Posters
| 2023 | Agilent Technologies
ICP/MS, ICP/MS/MS, Laser ablation
Instrumentation
ICP/MS, ICP/MS/MS, Laser ablation
Manufacturer
Agilent Technologies
Industries
High Throughput, Direct Analysis of Seawater using the Agilent 7800 ICP-MS with HMI for Aerosol Dilution
Applications
| 2017 | Agilent Technologies
ICP/MS
Instrumentation
ICP/MS
Manufacturer
Agilent Technologies
Industries
Environmental
Direct Analysis of Trace Metal Impurities in High Purity Nitric Acid Using ICP-QQQ
Applications
| 2018 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Determination of Ultratrace Impurities in Semiconductor Photoresist Using ICP-MS/MS
Applications
| 2023 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
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LabRulez s.r.o. All rights reserved. Content available under a CC BY-SA 4.0 Attribution-ShareAlike