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Determination of Trace Impurities in Electronic Grade Arsine by GC-ICP-QQQ
Applications
| 2020 | Agilent Technologies
GC, ICP/MS, Speciation analysis, ICP/MS/MS
Instrumentation
GC, ICP/MS, Speciation analysis, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
Agilent ICP-MS Journal (October 2020, Issue 82)
Others
| 2020 | Agilent Technologies
HPLC, ICP/MS, Speciation analysis, ICP/MS/MS
Instrumentation
HPLC, ICP/MS, Speciation analysis, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Environmental, Food & Agriculture, Energy & Chemicals , Semiconductor Analysis
Low reflectance measurements using the ‘VW’ technique
Technical notes
| 2011 | Agilent Technologies
NIR Spectroscopy, UV–VIS spectrophotometry
Instrumentation
NIR Spectroscopy, UV–VIS spectrophotometry
Manufacturer
Agilent Technologies
Industries
Fluorescence-free 785 nm material identification with MIRA XTR DS
Technical notes
| 2021 | Metrohm
RAMAN Spectroscopy
Instrumentation
RAMAN Spectroscopy
Manufacturer
Metrohm
Industries
Homeland Security
Dealing with Matrix Interferences in the Determination of the Priority Pollutant Metals by Furnace AA
Applications
| 2010 | Agilent Technologies
AAS
Instrumentation
AAS
Manufacturer
Agilent Technologies
Industries
Environmental
Agilent ICP-MS Journal (April 2018. Issue 72)
Others
| 2018 | Agilent Technologies
ICP/MS, ICP/MS/MS
Instrumentation
ICP/MS, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Food & Agriculture, Semiconductor Analysis
Trace Metal Analysis of Waters using the Carbon Rod Atomizer — a Review
Applications
| 2010 | Agilent Technologies
AAS
Instrumentation
AAS
Manufacturer
Agilent Technologies
Industries
Environmental
Measuring Inorganic Impurities in Semiconductor Manufacturing
Guides
| 2022 | Agilent Technologies
GC, ICP/MS, Speciation analysis, ICP/MS/MS
Instrumentation
GC, ICP/MS, Speciation analysis, ICP/MS/MS
Manufacturer
Agilent Technologies
Industries
Semiconductor Analysis
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WebinarsAbout usContact usTerms of use
LabRulez s.r.o. All rights reserved. Content available under a CC BY-SA 4.0 Attribution-ShareAlike