Library | LabRulez ICPMS

Sheath Gas High Solids Torch

Technical notes

| 2010 | Agilent Technologies

ICP/OES

Instrumentation

ICP/OES

Manufacturer

Agilent Technologies

Industries

Analysis of Metallic Impurities in Specialty Semiconductor Gases Using Gas Exchange Device (GED)-ICP-MS

Applications

| 2022 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Semiconductor Analysis

Delivering Clean Gases for Accurate Analyses

Brochures and specifications

| 2018 | Agilent Technologies

Consumables

Instrumentation

Consumables

Manufacturer

Agilent Technologies

Industries

Resolving REE2+ Overlaps on Arsenic and Selenium With Hydrogen Cell Gas

Technical notes

| 2021 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Environmental, Food & Agriculture

ANALYZE SAMPLES QUICKER, USING LESS GAS WITH AGILENT’S FAST SEQUENTIAL MODE

Others

| 2017 | Agilent Technologies

AAS

Instrumentation

AAS

Manufacturer

Agilent Technologies

Industries

Analysis of flue gas desulfurization wastewaters with the Agilent 7700x/7800 ICP-MS

Applications

| 2015 | Agilent Technologies

ICP/MS

Instrumentation

ICP/MS

Manufacturer

Agilent Technologies

Industries

Environmental

Sub-ppb detection limits for hydride gas contaminants using GC-ICP-QQQ

Applications

| 2015 | Agilent Technologies

GC, Speciation analysis, ICP/MS/MS

Instrumentation

GC, Speciation analysis, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Energy & Chemicals , Semiconductor Analysis

Gas chromatographic separation of metal carbonyls in carbon monoxide with detection using the Agilent 8800 ICP-QQQ

Applications

| 2016 | Agilent Technologies

GC, ICP/MS, Speciation analysis, ICP/MS/MS

Instrumentation

GC, ICP/MS, Speciation analysis, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Energy & Chemicals , Semiconductor Analysis

APWC: Investigation of ICP-MS/MS using oxygen or hydrogen as a reaction gas for interference-free analysis of phosphorus in organic solvents

Posters

| 2017 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Energy & Chemicals

Reaction data for 70 elements using O2 , NH3 and H2 gases with the Agilent 8800 Triple Quadrupole ICP-MS

Technical notes

| 2014 | Agilent Technologies

ICP/MS, ICP/MS/MS

Instrumentation

ICP/MS, ICP/MS/MS

Manufacturer

Agilent Technologies

Industries

Sheath Gas High Solids Torch

Analysis of Metallic Impurities in Specialty Semiconductor Gases Using Gas Exchange Device (GED)-ICP-MS

Delivering Clean Gases for Accurate Analyses

Resolving REE2+ Overlaps on Arsenic and Selenium With Hydrogen Cell Gas

ANALYZE SAMPLES QUICKER, USING LESS GAS WITH AGILENT’S FAST SEQUENTIAL MODE

Analysis of flue gas desulfurization wastewaters with the Agilent 7700x/7800 ICP-MS

Sub-ppb detection limits for hydride gas contaminants using GC-ICP-QQQ

Gas chromatographic separation of metal carbonyls in carbon monoxide with detection using the Agilent 8800 ICP-QQQ

APWC: Investigation of ICP-MS/MS using oxygen or hydrogen as a reaction gas for interference-free analysis of phosphorus in organic solvents

Reaction data for 70 elements using O2 , NH3 and H2 gases with the Agilent 8800 Triple Quadrupole ICP-MS

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